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Match List I (Isolation Technique in IC) with List II (Related Characteristic) and select the correct answer using the code given below:
List I
A. Reverse bias p-n junction isolation
B. Resistive isolation using the bulk
resistivity of the layer
C. Native oxide isolation
D. Oxide (other than native isolation)List II
1. Requires large area of the wafer,
thereby increasing the IC size
2. Best choice for silicon ICs with low parasitic capacitance
3. Suitable for ICs of III-V
semiconductors
4. Introduces bias-dependent parasitic
capacitance
b. A→2, B→3, C→4, D→1
c. A→4, B→3, C→2, D→1
d. A→2, B→1, C→4, D→3asked in Electronics Paper-1, 2005
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